Paper 2024/1149
Improved High-Order Masked Generation of Masking Vector and Rejection Sampling in Dilithium
Abstract
In this work, we introduce enhanced high-order masking techniques tailored for Dilithium, the post-quantum signature scheme recently standardized by NIST. We improve the masked generation of the masking vector
Metadata
- Available format(s)
-
PDF
- Category
- Implementation
- Publication info
- A minor revision of an IACR publication in TCHES 2024
- Keywords
- Side-channel countermeasuremaskinglattice-based signatures.
- Contact author(s)
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jscoron @ gmail com
francois gerard @ uni lu
tlepoint @ amazon com
matthias trannoy @ idemia com
rina zeitoun @ idemia com - History
- 2024-11-06: revised
- 2024-07-15: received
- See all versions
- Short URL
- https://ia.cr/2024/1149
- License
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CC BY
BibTeX
@misc{cryptoeprint:2024/1149, author = {Jean-Sébastien Coron and François Gérard and Tancrède Lepoint and Matthias Trannoy and Rina Zeitoun}, title = {Improved High-Order Masked Generation of Masking Vector and Rejection Sampling in Dilithium}, howpublished = {Cryptology {ePrint} Archive, Paper 2024/1149}, year = {2024}, url = {https://eprint.iacr.org/2024/1149} }